Unity quantum efficiency photodiode using porous silicon film

J. P. Zheng*, K. L. Jiao, W. P. Shen, W. A. Anderson, H. S. Kwok

*Corresponding author for this work

Research output: Chapter in Book/Conference Proceeding/ReportConference Paper published in a bookpeer-review

3 Citations (Scopus)

Abstract

A highly sensitive photodiode was fabricated with a metal-porous silicon junction. The spectral response was measured for the wavelength range from 400 nm to 1.075 μm. It was demonstrated that close to unity quantum efficiency could be obtained in the wavelength range of 630 to 900 nm without any anti-reflective coating. The detector response time is about 2 ns for a 9 volts reverse bias. The acceptance angle of photodiode is 2 times better than that of conventional Si detectors. The uniformity and stability were also studied. Possible mechanisms are discussed.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium Proceedings
PublisherPubl by Materials Research Society
Pages371-375
Number of pages5
ISBN (Print)1558991786
Publication statusPublished - 1993
Externally publishedYes
EventProceedings of the Second Symposium on Dynamics in Small Confining Systems - Boston, MA, USA
Duration: 30 Nov 19924 Dec 1992

Publication series

NameMaterials Research Society Symposium Proceedings
Volume283
ISSN (Print)0272-9172

Conference

ConferenceProceedings of the Second Symposium on Dynamics in Small Confining Systems
CityBoston, MA, USA
Period30/11/924/12/92

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